Double mask raster method for applying slurry in a discrete patt

Details Double mask raster method for applying slurry in a discrete patt Double mask raster method for applying slurry in a discrete patt

1979-01-30

1981-01-06

Hoffman, James R.

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

427 88, H01J 9227

Patent

active

042436958

ABSTRACT:
A double mask raster method for application of a number of different slurries in a discrete pattern, to produce a raster such as can be used in color television picture tubes, has a first mask having a plurality of apertures therein which remains immovably on the substrate throughout the application of all slurries. A separate second mask having a smaller number of aligned apertures therein is utilized with each successive application of a different slurry, allowing the slurry to penetrate the two masks to the substrate only where apertures in the two masks are aligned. The method may be used to apply slurries to flat or curved substrates in a vertical or horizontal position adapted for conventional spraying, or by means of electrostatic spraying.

REFERENCES:
patent: 3484269 (1969-12-01), Jonkers et al.
patent: 3593678 (1971-07-01), Miller
Valvo Reports, vol. XVIII issue 1/2, "Method in the Production Process", pp. 80-81.

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