Double loop liquid-liquid H.sub.2 S removal process

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423228, 423232, 4235762, 4235766, 423220, C01B 1716

Patent

active

056480547

ABSTRACT:
A process and system for removal of hydrogen sulfide from a hydrogen sulfide-containing gaseous stream comprising contacting the hydrogen sulfide-containing gaseous stream with a nonaqueous phase sorbent under conditions suitable for forming a hydrogen sulfide-laden sorbent and a clean gaseous stream. The hydrogen sulfide-laden sorbent is mixed with an aqueous phase redox coupled, regenerating the nonaqueous phase sorbent, reducing the aqueous phase redox couple, and forming sulfur. The sulfur is separated from the mixture. The reduced aqueous phase redox couple is extracted from the mixture and regenerated with an oxidizing agent or electrochemical cell.

REFERENCES:
patent: 3068065 (1962-12-01), Hartley et al.
patent: 4009251 (1977-02-01), Meuly
patent: 4091073 (1978-05-01), Winkler
patent: 4332781 (1982-06-01), Lieder et al.
patent: 4348368 (1982-09-01), Blytas
patent: 4359450 (1982-11-01), Blytas et al.
patent: 4382918 (1983-05-01), Diaz
patent: 4388293 (1983-06-01), Diaz
patent: 4390516 (1983-06-01), Blytas
patent: 4400368 (1983-08-01), Diaz
patent: 4402930 (1983-09-01), Diaz
patent: 4409199 (1983-10-01), Blytas
patent: 4414194 (1983-11-01), Blytas
patent: 4436711 (1984-03-01), Olson
patent: 4443423 (1984-04-01), Olson
patent: 4443424 (1984-04-01), Olson
patent: 4461754 (1984-07-01), Diaz
patent: 4518576 (1985-05-01), Diaz
patent: 4518577 (1985-05-01), Klecka
patent: 4649032 (1987-03-01), Snavely, Jr. et al.
patent: 4781901 (1988-11-01), Jeffrey
patent: 4816238 (1989-03-01), Jeffrey
patent: 4832937 (1989-05-01), Mc Intyre et al.
patent: 5223173 (1993-06-01), Jeffrey

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Double loop liquid-liquid H.sub.2 S removal process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Double loop liquid-liquid H.sub.2 S removal process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Double loop liquid-liquid H.sub.2 S removal process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1490761

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.