Double field oxide in field emission display and method

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Low workfunction layer for electron emission

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313310, 313311, 313336, 445 50, H01L 2906, H01L 2912

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active

06028322&

ABSTRACT:
A field emission display includes a substrate, a plurality of emitters formed on the substrate, a semiconductor device formed in or on the substrate for controlling the flow of electrons to the emitters and a dielectric layer formed on the substrate. An extraction grid is formed on the dielectric layer substantially in a plane of tips of the plurality of emitters and includes openings each surrounding one of the emitters. The display also includes a transparent viewing screen, a transparent conductor formed on the viewing screen and a cathodoluminescent layer formed on the transparent conductor. The semiconductor device includes a gate dielectric and a field oxide. Significantly, the field oxide includes an interfacial region acting as a trapping and recombination site for mobile charge carriers. As a result, the semiconductor device is more robust and is better able to resist parameter shifts or performance degradation due to exposure to X-rays and photons that are incidentally generated along with the desired images on the display. This results in a more robust field emission display.

REFERENCES:
patent: 3814968 (1974-06-01), Nathanson et al.
patent: 4940916 (1990-07-01), Borel et al.
patent: 5151061 (1992-09-01), Sandhu
patent: 5186670 (1993-02-01), Doan et al.
patent: 5210472 (1993-05-01), Casper et al.
patent: 5319233 (1994-06-01), Kane
patent: 5410218 (1995-04-01), Hush
patent: 5585301 (1996-12-01), Lee et al.
patent: 5702281 (1997-12-01), Huang et al.
patent: 5712534 (1998-01-01), Lee et al.
patent: 5721472 (1998-02-01), Browning et al.
patent: 5731597 (1998-03-01), Lee et al.
patent: 5780318 (1998-07-01), Hirano et al.
Kamimura et al., "Development of MOS Transistors for Radiation-Hardened Large Scale Integrated Circuits and Analysis of Radiation-Induced Degradation," Journal of Nuclear Science and Technology 31(1):24-33, 1994.
Neumeier and Bruemmer, "Radiation Hard LOCOS Field Oxide," IEEE Transactions on Nuclear Science 41(3):572-576, 1994.
Neumeier and Seegebrecht, "Radiation Tolerance of Double Layer Field Oxides," IEEE Transactions on Nuclear Science, 1992.

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