Double exposure and double etch technique for producing precisio

Details Double exposure and double etch technique for producing precisio Double exposure and double etch technique for producing precisio

1976-12-27

1978-05-30

Louie, Jr., Won H.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 36, 156661, G03C 500

Patent

active

040921662

ABSTRACT:
A double exposure and double etch technique for producing precision parts from a photosensitive material is described. The process is described in terms of producing an array of ink jet charge electrodes which comprise a series of small through holes on accurately defined centers. The process comprises the steps of exposing the photosensitive material through a mask to develop an undersized through hole and heat treating the photosensitive material to change its characteristics so that an etchable material is produced in the exposed area. The material is then etched to form the undersized through hole which is substantially tapered. The material is then exposed again with a full sized mask including any conductor patterns and the material is again heat treated. The material is again etched and this etching, in the nature of a surface etch, reduces the taper because of the lower etch rate of the unexposed material as compared to the much higher etch rate of the previously unetched tapered material.

REFERENCES:
patent: 3473927 (1969-10-01), Loose
patent: 3519522 (1970-07-01), Ference
patent: 3843394 (1974-10-01), Katayama et al.

Affiliated with

Also associated with

Rating

Double exposure and double etch technique for producing precisio does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Double exposure and double etch technique for producing precisio, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Double exposure and double etch technique for producing precisio will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-467553