Double deflection electron beam generator for employment in the

Details Double deflection electron beam generator for employment in the Double deflection electron beam generator for employment in the

1977-07-01

1978-09-26

Smith, Alfred E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 3714, 313

Patent

active

041173392

ABSTRACT:
This disclosure relates to an electron beam generator having a high brightness electron beam source and a focusing lens placed between the source and the target area to provide a large image focal distance relative to the object focal distance. In addition, two sets of deflection coils or plates are placed between the focusing means and the target where the first deflection means provides that deflection required for generation of the desired pattern and the second deflection means between the first deflection means and the target then deflects the beam back to a path normal to the target surface.

REFERENCES:
patent: 3569757 (1971-03-01), Brewer et al.
patent: 3894271 (1975-07-01), Pfeiffer et al.

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