Double chamber vacuum apparatus for thin layer deposition

Details Double chamber vacuum apparatus for thin layer deposition Double chamber vacuum apparatus for thin layer deposition

1992-04-03

1992-12-29

Beck, Shrive

Coating apparatus

Gas or vapor deposition

Multizone chamber

118704, 118707, 118715, C23C 1600

Patent

active

051748274

ABSTRACT:
An apparatus for thin layer vapor deposition has two horizontally spaced apart vacuum deposition chambers. Rearwardly and inwardly angled horizontal vacuum ducts are connected to the chambers, and a vacuum pumping device is connected to a further horizontal vacuum duct which communicates with the inwardly angled ducts. A computerized central system disposed between the chambers is operatively connected to the ducts and vacuum pumping device to enable either of the chambers to be used for set-up and evacuation while the other chamber is used for heating and deposition.

REFERENCES:
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patent: 4961832 (1990-10-01), Shagun et al.
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patent: 4975168 (1990-12-01), Ohno et al.
patent: 5016562 (1991-05-01), Madan et al.
patent: 5020475 (1991-06-01), Crabb et al.
Budo, Y. et al., "Modular Vacuum System", IBM Technical Disclosure Bulletin, vol. 17, No. 8 (Jan. 1975) pp. 2268-2269.

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