Dot-etchable masks from photopolymerizable elements

Details Dot-etchable masks from photopolymerizable elements Dot-etchable masks from photopolymerizable elements

1977-06-01

1979-11-06

Brammer, Jack P.

Stock material or miscellaneous articles

Structurally defined web or sheet

Including components having same physical characteristic in...

430 9, 430170, 430269, 430306, 430496, G03C 500, G03C 168

Patent

active

041736737

ABSTRACT:
Photopolymerizable elements are described comprising a sheet support, a photopolymerizable layer having a thickness of, at most, 0.0006 inch (0.015 mm.) and an optical density of at least 3.0 in the actinic region. Resist images made from these elements may be etched by a process of chemically undercutting the image areas and then spraying or rubbing them. The elements are useful as contact speed lithographic films and for other graphic arts applications.

REFERENCES:
patent: T900009 (1972-07-01), Durham et al.
patent: 3617287 (1971-11-01), Jeffers
patent: 3787211 (1974-01-01), Volkert et al.
patent: 3885963 (1975-05-01), Monahan
patent: 4002478 (1977-01-01), Kokawa et al.

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