Dot-etchable image-containing element useful in lithographic mas

Details Dot-etchable image-containing element useful in lithographic mas Dot-etchable image-containing element useful in lithographic mas

1984-09-07

1987-10-13

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

430331, 430917, 430918, 430423, 430424, 430309, G03C 168, G03F 702

Patent

active

046998594

ABSTRACT:
A reducible image-containing element which comprises a support material and a photopolymerized layer provided thereon, said photopolymerized layer having an image area which is cured at the upper part and not cured at the lower part, said non-cured lower part containing at least one of polyvalent phenols and their derivatives in an amount effective in preventing said non-cured lower part from curing.

REFERENCES:
patent: 2993789 (1961-07-01), Crawford
patent: 4173673 (1979-11-01), Bratt et al.
patent: 4174218 (1979-11-01), Pohl
patent: 4328304 (1982-05-01), Tachikawa et al.
patent: 4419438 (1983-12-01), Etoh et al.
patent: 4528261 (1985-07-01), Hauser
"An Improved Process for Staging Photopolymerized Dot-Etchable Masks", Research Disclosure, No. 21924, Jul. 1982, pp. 261-265.

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