Dot-enlargement process for photopolymer litho masks

Details Dot-enlargement process for photopolymer litho masks Dot-enlargement process for photopolymer litho masks

1980-11-21

1982-08-10

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 6, 430311, 430319, 430320, 430321, 430313, 430396, 430325, G03C 500

Patent

active

043438768

ABSTRACT:
An imaged element containing a polymeric relief or stencil image, in which the polymer contains crosslinkable moieties, is subjected to an image enlargement process by contacting the image with a solution containing a swelling agent for the image, and a crosslinking agent. The process is particularly useful in enlarging the half-tone image dot area of photopolymer litho masks wherein the half-tone image areas consist of hardened upper skins which rest on softer undervolumes having a lesser degree of polymerization or hardening.

REFERENCES:
patent: 3157717 (1964-02-01), Thommes
patent: 3255004 (1966-04-01), Thommes
patent: 3262780 (1966-07-01), Thommes
patent: 4125650 (1978-11-01), Chiu et al.
patent: 4173673 (1979-06-01), Bratt et al.

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