Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-09-05
2006-09-05
Wells, Nikita (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492100
Reexamination Certificate
active
07102146
ABSTRACT:
An ion implantation system having a dose cup located near a final energy bend of a scanned or ribbon-like ion beam of a serial ion implanter for providing an accurate ion current measurement associated with the dose of a workpiece or wafer. The system comprises an ion implanter having an ion beam source for producing a ribbon-like ion beam. The system further comprises an AEF system configured to filter an energy of the ribbon-like ion beam by bending the beam at a final energy bend. The AEF system further comprises an AEF dose cup associated with the AEF system and configured to measure ion beam current, the cup located substantially immediately following the final energy bend. An end station downstream of the AEF system is defined by a chamber wherein a workpiece is secured in place for movement relative to the ribbon-like ion beam for implantation of ions therein. The AEF dose cup is beneficially located up stream of the end station near the final energy bend mitigating pressure variations due to outgassing from implantation operations at the workpiece. Thus, the system provides accurate ion current measurement before such gases can produce substantial quantities of neutral particles in the ion beam, generally without the need for pressure compensation. Such dosimetry measurements may also be used to affect scan velocity to ensure uniform closed loop dose control in the presence of beam current changes from the ion source and outgassing from the workpiece.
REFERENCES:
patent: 4587433 (1986-05-01), Farley
patent: 4751393 (1988-06-01), Corey et al.
patent: 6323497 (2001-11-01), Walther
patent: 6441382 (2002-08-01), Huang
patent: 6489622 (2002-12-01), Chen et al.
patent: 6541780 (2003-04-01), Richards et al.
patent: 6624081 (2003-09-01), Dykstra et al.
patent: 6777696 (2004-08-01), Rathmell et al.
patent: 6946667 (2005-09-01), Chen et al.
patent: 2002/0121613 (2002-09-01), Scheuer et al.
patent: 2003/0066976 (2003-04-01), Chen et al.
patent: 2003/0183780 (2003-10-01), Sano et al.
patent: 2003/0230732 (2003-12-01), Sasaki
patent: 2004/0056210 (2004-03-01), Scherer
patent: 2005/0205807 (2005-09-01), Perel et al.
patent: 0 964 426 (1999-12-01), None
patent: 1 329 938 (2003-07-01), None
patent: 04282547 (1992-10-01), None
patent: 10172501 (1998-06-01), None
International Search Report, Int'l Application No. PCT/US2005/019526, Int'l Filing Date Jun. 6, 2005, 3 pgs.
Axcelis Technologies Inc.
Eschweiler & Associates LLC
Smith II Johnnie L
Wells Nikita
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