Dose control method

Details Dose control method Dose control method

1984-06-27

1985-09-03

Pianalto, Bernard D.

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

427 38, B05D 306

Patent

active

045392170

ABSTRACT:
A method and apparatus for measuring and compensating for neutral ions in an ion beam in the dose control system of an ion implanter. The gas pressure in the implantation volume (15) is measured, and the pressure signal is converted to an effective beam current signal in accordance with a known relationship among the gas pressure, the apparent beam current as measured by a Faraday cage and the neutral beam. The resulting effective beam current signal is inputted to the dose control system.

Affiliated with

Also associated with

Rating

Dose control method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dose control method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dose control method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-613227