Dose compensation by differential pattern scanning

Details Dose compensation by differential pattern scanning Dose compensation by differential pattern scanning

1982-02-16

1984-05-15

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

G01N 2300

Patent

active

044490518

ABSTRACT:
Precise control of radiation dose distribution over the surface of a workpiece is obtained by differential scanning in accord with a density of scanning traces function. This may be accomplished by differential repetition of the trace in the incremented area dA at generalized coordinates (p,q) of the surface, by frequency modulation of the waveform(s) controlling the scan, by spatial modulation of the scan through choice of scan pattern, or by combinations of these approaches.

REFERENCES:
patent: 3956635 (1976-05-01), Chang
patent: 4234358 (1980-11-01), Celles
patent: 4260893 (1981-04-01), Bakker et al.
patent: 4260897 (1981-04-01), Bakker et al.
patent: 4283631 (1981-08-01), Turner
"Automatic Electron Beam Publication of Micro-Size Devices", Wilson et al., Scanning Electron Microscopy, Apr. 1976, pp. 659-668.

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