Doped ferrite film

Stock material or miscellaneous articles – Web or sheet containing structurally defined element or... – Including a second component containing structurally defined...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

428336, 428692, 428694T, 428694TM, 428697, 428701, 428900, 428941, B32B 516

Patent

active

056958773

ABSTRACT:
Ferrite films are formed by reactively sputtering elemental iron in an oxygen-containing plasma to deposit a layer of iron oxide (14) on a ceramic substrate (12). A dopant layer (16) of a transition metal-oxide is reactively sputtered onto the iron oxide layer from a target of a transition metal, such as nickel or zinc, using an oxygen-containing plasma. The substrate, the layer of iron oxide and the dopant layer are all heated under conditions sufficient to diffuse the dopant layer into the layer of iron oxide, thereby forming a doped ferrite thin film (20). The resulting doped ferrite film can be FeFe.sub.2 O.sub.4, NiFe.sub.2 O.sub.4, (NiZn)Fe.sub.2 O.sub.4, or ZnFe.sub.2 O.sub.4.

REFERENCES:
patent: 4083709 (1978-04-01), Reade
patent: 4232061 (1980-11-01), Hattori et al.
patent: 4642245 (1987-02-01), Ishii et al.
patent: 4717584 (1988-01-01), Aoki et al.
patent: 4865658 (1989-09-01), Kudo
patent: 4975324 (1990-12-01), Torii et al.
patent: 5049454 (1991-09-01), Johnson et al.
patent: 5294312 (1994-03-01), Chin et al.
patent: 5320881 (1994-06-01), Vittoria
patent: 5521017 (1996-05-01), Yanagisawa et al.
patent: 5580671 (1996-12-01), Tamari et al.
"Ferrite Thin Films for Microwave Applications," Zaquine, H. Banazizi, Mage, J.C., Journal Applied Physics 64(10), 15 Nov. 1988, pp. 5B22-5B24, American Institute of Physics.
"Microwave Characterization of Microstrip Lines and Spiral Inductors in MCM-D Technology," Arnold, R.G., Pedder, D.J., IEEE Transactions on Components, Hybrids, and Manufacturing Technology, vol. 15, No. 6, Dec. 1992, pp. 1038-1045.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Doped ferrite film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Doped ferrite film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Doped ferrite film will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1606235

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.