Dopant film and methods of diffusing impurity into and manufactu

Details Dopant film and methods of diffusing impurity into and manufactu Dopant film and methods of diffusing impurity into and manufactu

1988-10-27

1991-06-18

Lesmes, George F.

Stock material or miscellaneous articles

Layer or component removable to expose adhesive

Halogen containing compound

428343, 428354, 437160, C09J 702

Patent

active

050248677

ABSTRACT:
A dopant film contains an organic binder, an inorganic binder and a compound of an impurity element for diffusion. Both surfaces of the dopant film are coated with adhesive. Releasable sheets sandwich the dopant film. The dopant film permits automated alternate stacking with semiconductor wafers, providing an advantage of labor saving. When the alternate stacking is automated, it will become hard for the wafer breakage to occur, sharply decreasing the rate of breakage. Furthermore, since the adhesion of a semiconductor wafer improves, the variation in the diffusion depth will decrease.

REFERENCES:
patent: 4756968 (1988-07-01), Ebe
patent: 4853286 (1989-08-01), Narimatsu

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