Gas separation – Means within gas stream for conducting concentrate to collector
Patent
1989-07-18
1990-06-26
Spitzer, Robert
Gas separation
Means within gas stream for conducting concentrate to collector
55 18, 55 72, 55158, 55208, 55267, 55270, B01D 5322
Patent
active
049368770
ABSTRACT:
A gas delivery system for supplying a vapor phase constituent at low concentration in a carrier gas, wherein the carrier gas is flowed through a contacting zone in which is disposed a permeable film through which the vapor phase constituent permeates into the contacing zone, to yield a product gas mixture comprising the vapor phase constituent and the carrier gas. In a particularly preferred embodiment, concentration of the vapor phase constituent in the product gas mixture is sensed, e.g., by a surface acoustical wave (SAW) concentration sensor device, and the concentration sensing is employed to controllably adjust the flow rate of the carrier gas flowed through the contacting zone, to maintain a selected delivery rate and concentration of the vapor phase constituent in the product gas mixture. The gas delivery system of the invention has particular utility for supplying gaseous dopant source compounds such as arsine, hydrogen selenide, and/or hydrogen telluride, for fabrication of semiconducting materials and semiconductor devices.
REFERENCES:
patent: 1685759 (1928-09-01), Walter
patent: 3721065 (1973-03-01), Robicheaux et al.
patent: 4325715 (1982-04-01), Bowman et al.
patent: 4398654 (1983-08-01), Pong et al.
patent: 4424067 (1984-01-01), Tarasenko et al.
patent: 4461165 (1984-07-01), Kesson
patent: 4469495 (1984-09-01), Hiraizumi et al.
patent: 4683039 (1987-07-01), Twardowski et al.
patent: 4723967 (1988-02-01), Tom
patent: 4738693 (1988-04-01), Tom
patent: 4744221 (1988-05-01), Knollmueller
patent: 4772296 (1988-09-01), Potts
patent: 4790945 (1988-12-01), Baker
patent: 4792405 (1988-12-01), Baker
R. N. Dietz and R. F. Wieser, "Sulfur Trioxide Permeation Tube For Calibration Of Sulfuric Acid Measurement Methods", Anal. Chem., 51, 2388-2391 (1979).
D. E. Saltzman, William R. Burg, and G. Ramaswamy, "Performance of Permeation Tubes as Standard Gas Sources," Environmental Science and Technology, 5, 1121-1128 (1971).
F. P. Scaringelli, A. E. O'Keeffe, E. Rosenberg, J. P. Bell, "Preparation of Known Concentrations of Gases and Vapors With Permeation Devices Calibrated Gravimetrically," Anal. Chem, 42, 871-876 (1979).
Techentrup and D. Klockow, "Preparation of Refillable Permeation Tubes," Anal. Chem., 50, 1728 91978).
"ASAT.TM. Microsensors for Chemistry," Integrated Chemical Sensors Corp. (Newton, Mss.) undated.
Hultquist Steven J.
Tom Glenn M.
Advanced Technology & Materials Inc.
Hultquist Steven J.
Spitzer Robert
LandOfFree
Dopant delivery system for semiconductor manufacture does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Dopant delivery system for semiconductor manufacture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dopant delivery system for semiconductor manufacture will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1123389