Coating apparatus – Gas or vapor deposition – Work support
Patent
1985-09-03
1988-06-21
Lawrence, Evan K.
Coating apparatus
Gas or vapor deposition
Work support
118500, 118733, C23C 1600, B05C 11115
Patent
active
047518952
ABSTRACT:
A door closure apparatus for processing a wafer paddle used to support microchips in a process tube using the chemical vapor deposition process. The device has a flexible joint which enables the sealing door to squarely seat against a processing tube whether or not the processing tube is correctly aligned. Further, the device has an adapter which enables paddles with variously shaped handles to be accepted in the standard processing tube as if the handles were round.
REFERENCES:
patent: 4137865 (1979-02-01), Cho
patent: 4487161 (1984-12-01), Hirata et al.
Lawrence Evan K.
Shaffer, Jr. John Nevin
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