Divided reticles for charged-particle-beam microlithography...

Details Divided reticles for charged-particle-beam microlithography... Divided reticles for charged-particle-beam microlithography...

2005-08-30

2005-08-30

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

C250S492200, C250S491100, C250S398000, C430S005000, C430S290000, C430S325000, C430S326000, 43, 43

Reexamination Certificate

active

06936831

ABSTRACT:
Reticles and apparatus for performing charged-particle-beam microlithography, and associated methods, are disclosed, in which the pattern to be transferred to a sensitive substrate is divided according to any of various schemes serving to improve throughput and pattern-transfer accuracy. The methods and apparatus are especially useful whenever a divided stencil reticle is used that includes complementary pattern portions.

REFERENCES:
patent: 4282437 (1981-08-01), Boie
patent: 4607167 (1986-08-01), Petric
patent: 4742234 (1988-05-01), Feldman et al.
patent: 4812661 (1989-03-01), Owen
patent: 5674413 (1997-10-01), Pfeiffer et al.
patent: 5874198 (1999-02-01), Okino
patent: 6023068 (2000-02-01), Takahashi
patent: 6147355 (2000-11-01), Ando et al.

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