Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
1998-06-11
2001-09-18
Grant, William (Department: 2121)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S003000, C318S568110
Reexamination Certificate
active
06292708
ABSTRACT:
TECHNICAL FIELD
The present invention relates generally to a control system for use with a semiconductor wafer processing machine. In particular, the present invention relates to a distributed control system that employs a plurality of functional modules capable of independently operating a portion of a semiconductor wafer processing machine.
BACKGROUND OF THE INVENTION
A number of processing systems exist for use during the manufacture of semiconductor wafers, magnetic memory disks, optical devices, and other delicate workpieces. For example, chemical mechanical polishing (CMP) machines are utilized to planarize the surfaces of semiconductor wafers, and wafer cleaning machines are utilized to clean and rinse the surfaces of such semiconductor wafers following the planarization process. Processing speed is an important factor in the semiconductor fabrication industry because increased product throughput relates directly to increased profitability. Accordingly, CMP machines, cleaning systems, and other processing devices are being developed in a manner that increases efficiency while maintaining reliability and robustness. Indeed, some semiconductor processing systems now utilize several combined subsystems in lieu of a number of individual distinct machines.
Semiconductor processing systems that combine several functions (e.g., polishing, cleaning, and rinsing) typically require intricate electronic control systems. Consequently, the efficiency and reliability of any given processing system may be directly related to the design and architecture of the control system. Furthermore, the cost of installation, testing, troubleshooting, and maintenance of the processing system may also be directly related to the complexity of the control system and how the control system interacts with the various functional components and subsystems of the processing system.
A prior art control system for a multiple function wafer processing system may employ a plurality of control modules concentrated in one central location, where each of the control modules are dependent upon a master controller. Such an architecture does not lend itself to independent testing and troubleshooting of the individual subsystems. In other words, such control systems require the entire processing system to be assembled and tested as an integral whole. Prior art control systems may employ individual control modules that are considered as “best in class” for their particular functions. Unfortunately, the “best in class” modules may be manufactured by different companies, which may present compatibility problems and cause the overall control system to be difficult to support and maintain. In addition, the use of “best in class” components may not necessarily result in the best combined control system.
Prior art control systems may not be adapted to independently control the different subsystems in a manner that enables continuous batch-specific processing with different polishing or cleaning parameters. Such prior art systems may be limited to the use of one processing recipe per run of wafers. Furthermore, such prior art control systems may control the operation of the processing system via serial instructions; the individual subsystems may be configured in a daisy chain arrangement. The use of serial instructions may lead to an unacceptable amount of wait time between processing stations and, consequently, an undesirably low processing throughput.
A prior art control system program for a semiconductor processing system may be integrally designed along with the application software associated with the processing system. With such an arrangement, changes to the control system hardware or software (e.g., type of processor, memory capacity, operating system, etc.) may require substantial modifications to the control system operating software. Similarly, any changes to the application-specific code associated with the processing system may require corresponding changes to the control system operating software.
SUMMARY OF THE INVENTION
Accordingly, it is an advantage of the present invention that an improved control system for use with a multifunction semiconductor processing system is provided.
Another advantage of the present invention is that it provides a control system that increases the efficiency, reliability, and robustness of a multifunction semiconductor processing system.
Another advantage is that the present invention provides a distributed control system having a plurality of independent control modules associated with a number of subsystems employed by a semiconductor processing system.
A further advantage of the distributed control system is that each subsystem may be individually tested and diagnosed without having the entire processing system active.
Another advantage of the present invention is that it provides a control system capable of regulating and controlling the application of different processing recipes during a single continuous run.
A further advantage of the control system is that it may control and regulate the various subsystems in a parallel manner to thereby reduce downtime and increase wafer throughput.
According to one aspect of the present invention, the control system is designed to utilize a separate software application that is compatible with the application software associated with the semiconductor processing system. This enables the control system to be modified independent of the application software or with minimal changes to the application software.
The above and other advantages of the present invention may be carried out in one form by a distributed control system for use in a multifunction semiconductor wafer processing system having a plurality of processing stations. Such a control system may include: a plurality of autonomous application control modules, each being configured to control a portion of a semiconductor wafer processing procedure; an autonomous master control module configured to communicate with and regulate the operation of the application control modules; and a data communication link configured to connect the application control modules and the master control module into a network arrangement.
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Allen Robert F.
Jordan Ricardo T.
Bahta Kidest
Grant William
Snell & Wilmer LLP
SpeedFam-IPEC Corporation
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