Distortion measurement method and exposure apparatus

Details Distortion measurement method and exposure apparatus Distortion measurement method and exposure apparatus

2005-09-20

2005-09-20

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Distortion introducing or rectifying

C355S053000, C355S077000

Reexamination Certificate

active

06947119

ABSTRACT:
A method includes steps of exposing each of first shot regions on a substrate to a plurality of first marks aligned at a predetermined interval via a master and a projection optical system, and exposing each of second shot regions on the substrate to a plurality of second marks aligned at the predetermined interval via the master and the projection optical system. The first and second shot regions are arranged so as to make positions of a plurality of transferred first and second marks on the substrate correspond to each other, and the number of the transferred first marks in the first shot region being larger than the number of the transferred second marks in the second shot region. In addition, a distortion amount of the projection optical system is calculated based on a positional difference measured for the transferred first and second marks which correspond to each other.

REFERENCES:
patent: 4585342 (1986-04-01), Lin et al.
patent: 4780616 (1988-10-01), Nishi et al.
patent: 4908656 (1990-03-01), Suwa et al.
patent: 5402224 (1995-03-01), Hirukawa et al.
patent: 58-083853 (1983-05-01), None
patent: 63-38697 (1988-08-01), None
patent: 3259190 (2001-12-01), None

Affiliated with

Also associated with

Rating

Distortion measurement method and exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Distortion measurement method and exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Distortion measurement method and exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3440734