Distortion inspecting method for projection optical system

Details Distortion inspecting method for projection optical system Distortion inspecting method for projection optical system

1993-09-24

1995-03-28

Evans, F. L.

Optics: measuring and testing

Lens or reflective image former testing

For optical transfer function

355 53, 355 77, G01B 1100

Patent

active

054022240

ABSTRACT:
A method for inspecting distortion characteristics of a projection optical system to be inspected by arranging a mask formed with measurement patterns at a plurality of predetermined positions on the object surface side of the projection optical system, transferring projected images of the plurality of measurement patterns onto a photosensitive substrate arranged on the image surface side of the projection optical system, and detecting transfer images of the measurement-patterns, includes:
the step of exposing a mask, on which pairs of first and second measurement patterns are arranged adjacent to each other to be separated by a predetermined interval .DELTA.T in one direction at positions on the mask corresponding to a plurality of points at which distortion amounts are to be inspected in a projection view field of the projection optical system, onto the photosensitive substrate via the projection optical system;
the step of exposing the mask onto the photosensitive substrate via the projection optical system after the mask and the photosensitive substrate are moved relative to each other by an amount determined by the interval .DELTA.T with respect to the state in the preceding step;
the step of measuring relative displacements between overlapping images of the first and second measurement patterns at different image height points in the projection view field of the projection optical system; and
the step of calculating a value obtained by sequentially accumulating the measured relative displacements in units of image height values as a distortion amount at the corresponding image height point.

REFERENCES:
patent: 3260153 (1966-07-01), Abbott, Jr. et al.
patent: 4585342 (1986-04-01), Lin et al.
patent: 4629313 (1986-12-01), Tanimoto
patent: 4710026 (1987-12-01), Magome et al.
patent: 4759626 (1988-07-01), Kroko
patent: 4780616 (1988-10-01), Nishi et al.
patent: 4908656 (1990-03-01), Suwa et al.

Affiliated with

Also associated with

Rating

Distortion inspecting method for projection optical system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Distortion inspecting method for projection optical system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Distortion inspecting method for projection optical system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2254855