Distillation: processes – separatory – Distilling to separate or remove only water – From organic compound
Patent
1974-12-23
1976-11-02
Yudkoff, Norman
Distillation: processes, separatory
Distilling to separate or remove only water
From organic compound
203 33, 203 36, 260475R, 260525, B01D 300
Patent
active
039896005
ABSTRACT:
A process for treating an aqueous solution containing organic compounds and having a high chemical oxygen demand (COD) by distilling the aqueous solution at a pH not lower than 9, and recovering the water of low chemical oxygen demand (COD) from said aqueous solution. The aqueous solution containing the organic compounds to be treated is derived from the reaction mixture of the oxidation system of methyl-substituted aromatic compound in the liquid phase with molecular oxygen or a molecular oxygen-containing gas, in the presence of a heavy metal catalyst but in the substantial absence of a lower aliphatic acid solvent, to form the corresponding aromatic acid.
REFERENCES:
patent: 2444527 (1948-07-01), Pomeroy
patent: 2494133 (1950-01-01), Jeffs
patent: 2508911 (1950-05-01), Garner
patent: 2938837 (1960-05-01), Meyer et al.
patent: 3047612 (1962-07-01), Pennington et al.
patent: 3432399 (1969-03-01), Schutt
patent: 3558277 (1971-01-01), Laman et al.
patent: 3890374 (1975-06-01), Fujii
Parsons: Chemical Treatment of Sewage & Industrial Wastes pp. 33-47 relied upon.
Bochinski: Pollution Engineering 1/73 pp. 45 & 46.
Harada Tomio
Namie Koshi
Sakurai Masayuki
Shirahige Hiroshi
Takahashi Satoshi
Sofer J.
Teijin Hercules Chemical Co., Ltd.
Yudkoff Norman
LandOfFree
Distilling H.sub.2 O from aromatic carboxylic acid at a pH excee does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Distilling H.sub.2 O from aromatic carboxylic acid at a pH excee, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Distilling H.sub.2 O from aromatic carboxylic acid at a pH excee will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1157832