Distillation: processes – separatory – With disparate physical separation – Utilizing liquid sorption of component from gas or vapor
Patent
1983-05-23
1984-11-27
Bascomb, Wilbur
Distillation: processes, separatory
With disparate physical separation
Utilizing liquid sorption of component from gas or vapor
203 39, 203 87, 203 98, 208349, 208368, 208369, 202185A, B01D 314
Patent
active
044849834
ABSTRACT:
A process for the distillation and condensation of a multi-component liquid is described, the process being characterized by the contacting of a warm portion of the overhead vapor with a cool liquid portion of the overhead to achieve a higher accumulator liquid temperature. In a principal embodiment, a multi-component liquid is distilled, the overhead vapor is separated into major and minor portions, and the bulk of the major portion is condensed. Liquid is separated from the remaining vapor of the major portion, and the separated liquid is divided into major and minor fractions. The major fraction of liquid is collected in an accumulation zone, and is contacted in the accumulation zone with at least the bulk of the minor portion of overhead vapor. Vapor from the accumulation zone is contacted with the minor fraction of liquid in a contacting zone.
REFERENCES:
patent: 2398396 (1946-04-01), Powell
patent: 2915462 (1959-12-01), Salmon
patent: 3039941 (1962-06-01), Sweeney et al.
patent: 3320159 (1967-05-01), Potts
patent: 3401093 (1968-09-01), Cox
patent: 3427228 (1969-02-01), Constantikes et al.
patent: 3493470 (1970-02-01), Irvin
patent: 3824177 (1974-07-01), Honerkamp et al.
patent: 4235706 (1980-11-01), Bannon
Adamcik Albert J.
Bascomb Wilbur
Shell Oil Company
LandOfFree
Distillation and vapor treatment process does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Distillation and vapor treatment process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Distillation and vapor treatment process will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2133142