Dissociation of silicon clusters in a gas phase during...

Semiconductor device manufacturing: process – Having diamond semiconductor component

Reexamination Certificate

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C438S931000, C257S077000, C257SE21054, C257SE21065

Reexamination Certificate

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10431819

ABSTRACT:
A method of forming a layer of silicon carbide wherein silicon clusters are dissociated in a gas phase. Silicon clusters may be dissociated by a silicon-etching gas such as a group VII-containing component. A semiconductor device is also disclosed having a layer formed by the methods of the invention.

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