Disproportionation of chlorosilane

Chemistry of inorganic compounds – Silicon or compound thereof – Halogen containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423347, C01B 3308, C01B 3304

Patent

active

041138457

ABSTRACT:
Process for the disproportionation of a chlorosilicon hydride which comprises contacting it with an ion exchange resin containing tertiary amino or quaternary ammonium group bonded therein. There is described a cyclic process in which a fixed bed of the resin may be employed.

REFERENCES:
patent: 2834648 (1958-05-01), Bailey et al.
patent: 3037052 (1962-05-01), Bortnick
patent: 3367889 (1968-02-01), Oline

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Disproportionation of chlorosilane does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Disproportionation of chlorosilane, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Disproportionation of chlorosilane will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2384522

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.