Disposition tool for factory process control

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Quality evaluation

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

702 81, 702 84, 702181, 700109, 700121, 438 14, H01L 2166

Patent

active

061547115

ABSTRACT:
A method of manufacturing semiconductor wafers using a simulation tool to determine a set of predicted wafer electrical test parameters. The set of predicted wafer electrical test parameters are compared with wafer electrical test specifications tabulated for each process during the manufacturing process. During the comparison, it is determined whether the predicted wafer electrical test parameters are within the specifications for the process and circuit simulations are then conducted using the predicted wafer electrical test parameters. Device performance is predicted from the circuit simulations and the disposition of the wafer lot is determined utilizing tabulated from a disposition performance table.

REFERENCES:
patent: 5511005 (1996-04-01), Abbe et al.
patent: 5646870 (1997-07-01), Krivokapic et al.
patent: 5719796 (1998-02-01), Chen
patent: 5822218 (1998-10-01), Moosa et al.
patent: 5866437 (1999-02-01), Chen et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Disposition tool for factory process control does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Disposition tool for factory process control, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Disposition tool for factory process control will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1734967

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.