Disposal process for halogenated organic material

Chemistry of inorganic compounds – Nitrogen or compound thereof – Ammonia or ammonium hydroxide

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423240, 423481, C01B 701, C01B 708

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active

044683766

ABSTRACT:
A method for disposing of a halogenated organic material includes the steps of partially oxidizing the halogenated organic material, a hydrocarbonaceous material, and a nitrogen compound with a free-oxygen containing gas and optionally with a temperature moderator in a synthesis gas generator under partial oxidation conditions. The partial oxidation produces a synthesis gas containing, among others, hydrogen halide and ammonia. The synthesis gas is then contacted with a quench medium which dissolves the hydrogen halide into the quench medium. The hydrogen halide and quench medium can be disposed of by the addition of a base to form a readily disposed metal salt of the halide.

REFERENCES:
patent: 4018879 (1977-04-01), Winnen
patent: 4038369 (1977-07-01), Winston et al.
patent: 4059677 (1977-11-01), Sare et al.
patent: 4125593 (1978-11-01), Scheifley et al.
patent: 4198384 (1980-04-01), Robinson
patent: 4206186 (1980-06-01), Holter et al.
patent: 4211646 (1980-07-01), Westbrook et al.
patent: 4233280 (1980-11-01), Langens et al.
patent: 4346069 (1982-08-01), Riegel et al.
patent: 4351819 (1982-09-01), Riegel et al.

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