Disposable hard mask for photomask plasma etching

Details Disposable hard mask for photomask plasma etching Disposable hard mask for photomask plasma etching

2005-06-21

2005-06-21

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S313000, C430S396000

Reexamination Certificate

active

06908716

ABSTRACT:
A method for creating a photomask which includes a layer of hard mask material the inclusion of which improves the uniformity of critical dimensions on the photomask by minimizing the affect of macro and micro loading. The method for producing the photomask of the instant invention includes two etching processes. The first etching process etches the layer of hard mask, and the second etching process etches the anti-reflective material and opaque material.

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