Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2008-03-11
2008-03-11
Fourson, George R. (Department: 2823)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S585000, C438S706000
Reexamination Certificate
active
11100563
ABSTRACT:
A method includes forming a group of disposable hard mask structures on a semiconductor device that includes a group of memory cells. The method further includes using the disposable hard mask structures to precisely control a junction profile of the memory cells.
REFERENCES:
patent: 5753557 (1998-05-01), Tseng
patent: 6171940 (2001-01-01), Huang
patent: 6576562 (2003-06-01), Ohuchi et al.
patent: 6605541 (2003-08-01), Yu
patent: 6607955 (2003-08-01), Lee
patent: 6620741 (2003-09-01), Gracias et al.
patent: 6764903 (2004-07-01), Chan et al.
patent: 6797565 (2004-09-01), Yang et al.
patent: 6864556 (2005-03-01), You et al.
patent: 6927145 (2005-08-01), Yang et al.
patent: 7037850 (2006-05-01), Lee et al.
patent: 2002/0086547 (2002-07-01), Mui et al.
patent: 2003/0096503 (2003-05-01), Cho et al.
patent: 2004/0005778 (2004-01-01), Kronke et al.
patent: 2004/0058518 (2004-03-01), Fang et al.
patent: 2005/0136630 (2005-06-01), Kim
patent: 2005/0212035 (2005-09-01), Utsuno et al.
patent: 2006/0030151 (2006-02-01), Ding et al.
patent: 2006/0154477 (2006-07-01), Geng et al.
patent: 2006/0264002 (2006-11-01), Tran et al.
patent: 101 10 150 (2002-09-01), None
patent: 1 170 800 (2002-01-01), None
2002 IEEE International Solid-State Circuits Conference, Session 6, “SRAM and Non-Volatile Memories,” Feb. 4, 2004,6pages.
2002 IEEE International Solid-State Circuits Conference, 29 pages.
Chen Cinti Xiaohua
Hui Angela T.
Ngo Minh-Van
Tokuno Hirokazu
Advanced Micro Devices , Inc.
Fourson George R.
Harrity & Snyder LLP
Parker John M.
Spansion LLC
LandOfFree
Disposable hard mask for forming bit lines does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Disposable hard mask for forming bit lines, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Disposable hard mask for forming bit lines will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3941303