Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1989-02-21
1989-07-18
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041831, 2041801, 935 52, 935 85, 935 93, 435287, 435173, 4351722, 4351723, C12N 1300, C12N 1500
Patent
active
048490890
ABSTRACT:
An electromanipulation chamber for selectively holding a suspension of vesicles is disclosed having a one-piece holder molded from dielectric material wherein the holder comprises an outer cylindrically-shaped collar and an inner circular-shaped ring having a formed annular region centrally located therein. A passageway is formed through the ring and the collar and a pair of electrodes having a diameter slightly greater than the inner diameter of the collar is mounted on opposing sides of the annular region. The pair of electrodes and the annular region form the electromanipulation chamber and a positive fluid-tight seal is formed aournd the edges of the annular region with electrodes to contain the suspension with the vesicles.
REFERENCES:
patent: 3095359 (1963-06-01), Heller
patent: 4634665 (1987-01-01), Axel et al.
"Introduction and Expression of DNA Molecules in Eukaryotic Cells by Electroporation"--Andreason & Evans, BioTechniques--vol. 6, No. 7 (1988).
"Hemolysis of Human Erythrocytes by a Transient Electric Field"--Kinosita and Tsong--Proc. Natl. Acad. Sc. U.S.A., vol. 74, No. 5, pp. 1923-1927, May 1977, Biochemistry.
Electropore, Inc.
Niebling John F.
Starsiak Jr. John S.
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