Alloys or metallic compositions – Titanium base – Aluminum containing
Patent
1990-02-07
1991-02-05
Stoll, Robert L.
Alloys or metallic compositions
Titanium base
Aluminum containing
420417, 420418, C22C 1400
Patent
active
H00008877
ABSTRACT:
A titanium alloy comprising about 15 to 25 atomic percent (a/o) aluminum, about 0.05 to 12 a/o of at least one beta eutectoid stabilizing element and about 4 to 12 a/o of at least one beta isomorphous stabilizing element, balance titanium. The beta eutectoid element is at least one of Cu, Ni, Cr, Er, Y, Ce, Si, B or C. The beta isomorphous stabilizing element is Nb or a mixture of Nb with Ta, Mo or V, wherein the Nb can be replaced by Ta, Mo or V up to about half of the stated quantity.
The presently preferred amounts of the beta eutectoid stabilizing elements are as follows: Cu, Ni or Cr, about 4.50 to 12.0 a/o; Si, B or C, about 0.70 to 5.0 a/o; Er, Y or Ce, about 0.05 to 0.25 a/o.
REFERENCES:
patent: 2880087 (1959-03-01), Jaffee
patent: 3615378 (1971-10-01), Bomberger, Jr. et al.
patent: 4292077 (1981-09-01), Blackburn et al.
patent: 4788035 (1988-11-01), Gigliotti et al.
Venketaraman et al., "The Influence of Niobium Addition on Structure and Properties of Rapidly Solidified . . . " Metals Ab #88(9):12-1066.
Sutliff et al., "Rare Earth Oxide Dispersoid Stability and Microstructure Effects in Rapidly Solidified Ti.sub.3 Hl and Ti.sub.3 Al-Nb." Metals Ab. #86(11):12-1463.
Froes Francis H.
Venkataraman Ganapathy
Bricker Charles E.
Singer Donald J.
Stoll Robert L.
Sweet Greg M.
The United States of America as represented by the Secretary of
LandOfFree
Dispersion strengthened tri-titanium aluminum alloy does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Dispersion strengthened tri-titanium aluminum alloy, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dispersion strengthened tri-titanium aluminum alloy will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1071