Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including internal mixing or stirring means
Reexamination Certificate
2011-04-12
2011-04-12
Griffin, Walter D (Department: 1774)
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Including internal mixing or stirring means
C422S129000, C422S224000, C422S648000, C366S336000, C210S511000
Reexamination Certificate
active
07922981
ABSTRACT:
Apparatus for intensifying heterogeneous chemical reactions is described. For the case of liquid-liquid reactions, with drops of a reactant distributed throughout the second continuous reactant, the physical phenomena of drop dispersion (break up) and drop coalescence are identified as the main physical steps affecting reaction rates. A basic flow cell structure is described in which the respective actions of dispersion and coalescence can be greatly intensified through the creation of enhanced body forces and shear flow zones. The basic cell structure can be arranged into pipe flow reactors to suit any production or process requirements. The basic cell structure is equally applicable to gas-liquid reactions with drops of one reactant being conveyed by a moving gas stream.
REFERENCES:
patent: 4994242 (1991-02-01), Rae et al.
patent: 5500116 (1996-03-01), Nakayama et al.
patent: 5616818 (1997-04-01), Pirkl et al.
patent: 6506949 (2003-01-01), Gillis et al.
patent: 0779270 (1997-06-01), None
patent: 816480 (1981-04-01), None
Anilitics Process Chemistry & Engineering, Inc.
Griffin Walter D
Kolisch & Hartwell, P.C.
Young Natasha
LandOfFree
Dispersion-intensified, coalescence-intensified chemical... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Dispersion-intensified, coalescence-intensified chemical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dispersion-intensified, coalescence-intensified chemical... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2723873