Dispersion and stabilization of reactive atoms on the surface of

Catalyst – solid sorbent – or support therefor: product or process – Catalyst or precursor therefor – Halogen or compound containing same

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

502226, 502227, 502229, 502231, 502324, 502325, 502328, 502329, 502330, 502332, 502336, 502337, 502338, 502344, 502340, B01J 2706, B01J 2304

Patent

active

060872942

ABSTRACT:
Particulate metal oxide compositions having reactive atoms stabilized on particulate surfaces and methods for reacting the compositions with saturated and unsaturated species are provided. The preferred particulate metal oxides of the compositions are nanocrystalline MgO and CaO with an average crystallite size of up to about 20 nm. The preferred reactive atoms of the compositions are atoms of the halogens and Group IA metals. In one embodiment, chlorine atoms are stabilized on the surface of nanocrystalline MgO thus forming a composition which is capable of halogenating compounds, both saturated and unsaturated, in the absence of UV light and elevated reaction temperatures.

REFERENCES:
patent: 4672145 (1987-06-01), Kolts et al.
patent: 4728636 (1988-03-01), Sofranko
patent: 4895823 (1990-01-01), Kolts et al.
patent: 4997802 (1991-03-01), Matsuura et al.
patent: 5071815 (1991-12-01), Wallace et al.
Tanabe, K., Misono,M.; Ono, Y. and Hattori, H. "New Solid Acids and Bases", Elsevier, Amsterdam, p. 38, 213, 2131 (1989), no month available.
Matsuhashi, H. and Arata, K. J. Phys. Chem., 99, 11178 (1995), no month available.
Haag, W.O. and Pines, H. J. Am. Chem. Soc., 82, 387 (1960), no month available.
Matsuda, t., Tanabe, J., Hayashi, N., Sasaki, Y. Miura, H. and Sugiyama, K. Bull. Chem. Soc. Jpn., 55, 990-994 (1982), no month available.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dispersion and stabilization of reactive atoms on the surface of does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dispersion and stabilization of reactive atoms on the surface of, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dispersion and stabilization of reactive atoms on the surface of will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-542190

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.