Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to attribute – absence or presence of work
Patent
1998-11-03
2000-08-08
Edwards, Laura
Coating apparatus
Control means responsive to a randomly occurring sensed...
Responsive to attribute, absence or presence of work
118695, 118696, 118704, 118703, B05C 1100
Patent
active
060996463
ABSTRACT:
A dispensing system used in a spin coater is provided to transport a solvent to a wafer. The dispensing, system includes a switch valve, a sucking-back valve, a solenoid valve, a speed control unit of the sucking-back valve, and a speed control unit of the switch valve. The switch valve controls a solvent dispensing status. The sucking-back valve receives the solvent from the switch valve and exports the solvent to a wafer. The solenoid valve controls the switch valve and the sucking-back valve. The speed control unit of the switch valve is coupled between the switch valve and the solenoid valve and is used for a control of action speed on the switch valve. The speed control unit of the sucking-back valve is coupled between the switch valve and the sucking-back valve, and is used for a control of action speed of the sucking-back valve by a sufficient delay time of action.
REFERENCES:
patent: 5134962 (1992-08-01), Amada et al.
Huang Kuo-Feng
Lai Kuei-Hsi
Tan En-Tien
Yang Ming-Che
Edwards Laura
Koch, III George R
United Microelectronics Corp.
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