Dispensing – Nozzles – spouts and pouring devices – Antidrip
Patent
1998-11-03
2000-05-16
Kaufman, Joseph A.
Dispensing
Nozzles, spouts and pouring devices
Antidrip
118 52, 118 56, 118319, 118320, B65D 572
Patent
active
060624426
ABSTRACT:
A photoresist dispensing system used in a photoresist coating machine includes a pump, a sucking-back valve, a solenoid valve, a first pump speed controller, a second pump speed controller and a sucking-back speed controller. The pump is used to transport photoresist and spray a substrate. The sucking-back valve is used to suck back liquid photoresist from a transporting duct end. The solenoid is used to activate or inactivate the pump and the sucking-back valve. The first and the second pump speed controllers are separately coupled between the pump and the solenoid valve, and the sucking-back speed controller is coupled between the sucking-back valve and the sucking-back speed controller is coupled between the sucking-back valve and the route, where is between the pump and the second pump speed controller. Hence, the sucking-back valve produces a sucking force after the pump is inactivated and releases a sucking force after pump is activated.
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Huang Kuo-Feng
Liu Eric
Tan En-Tien
Yang Ming-Che
Bui Thach
Kaufman Joseph A.
United Microelectronics Corp.
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