Dispatching apparatus with a gas supply distribution system for

Details Dispatching apparatus with a gas supply distribution system for Dispatching apparatus with a gas supply distribution system for

1993-08-03

1995-05-02

Bucci, David A.

Material or article handling

Plural, static structures for supporting discrete loads and...

Load-underlying members

414940, B65G 104

Patent

active

054113580

ABSTRACT:
The dispatching apparatus with a gas supply distribution system (300) basically comprises an automatic handler 301 and a vertical stocker (302). The vertical stocker has a frame (308) formed by an assembly of tubes supporting a plurality of support stations or bins (309) each provided with gas infectors (311) connected on the one hand to the gas injection valves of the container and on the other hand to a compressed ultra pure neutral gas supply installation. As a result, during the processing idle times, an adequate overpressure of said neutral gas is maintained in the interior space of the container enclosing the workpiece, e.g. a silicon wafer. The automatic handler (301) basically comprises a handling robot (305) having an extending arm (306) provided with gripping means (307) adapted to the container design. The handling robot (305) is affixed on an elevator (304) for vertical movement and is able to rotate about it. The automatic handler (301) is adapted to transfer of containers (100) between the vertical stocker and conventional conveyors ( 401, 402) or between the conveyors themselves.

REFERENCES:
patent: 4964776 (1990-10-01), Wakita et al.
patent: 4981409 (1991-01-01), Hirose et al.
patent: 4995430 (1991-02-01), Bonora et al.
patent: 5059079 (1991-10-01), Foulke et al.
patent: 5064337 (1991-11-01), Asakawa et al.
patent: 5143193 (1992-09-01), Geraci
patent: 5220548 (1993-06-01), Nakatsukssa et al.
patent: 5284412 (1994-02-01), Shiraiwa et al.
Solid State Technology, vol. 33, No. 8, Aug. 1990, pp. S1-S5, Claude Doche, "Wafer Confinement for Control of Contamination in Microelectronics".

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