Dispatch and/or disposition of material based upon an...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C700S100000, C700S109000, C438S005000

Reexamination Certificate

active

06947803

ABSTRACT:
A method and an apparatus for affecting dispatch and/or disposition of a workpiece. A process step upon a workpiece is performed based upon a predetermined routing plan. An end-of-line parameter is modeled based upon the process performed upon the workpiece. A workpiece routing/disposition process is performed based upon modeling an end-of-line (EOL) parameter. The workpiece routing/disposition process includes using a controller to modify the routing plan.

REFERENCES:
patent: 5801965 (1998-09-01), Takagi et al.
patent: 5907492 (1999-05-01), Akram et al.
patent: 6154711 (2000-11-01), Steffan et al.
patent: 6349240 (2002-02-01), Ogawa et al.
patent: 6496958 (2002-12-01), Ott et al.
patent: 6703573 (2004-03-01), Beffa
patent: 6727106 (2004-04-01), Ankutse et al.
patent: 2003/0182252 (2003-09-01), Beinglass et al.
patent: 2004/0064296 (2004-04-01), Saxena et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dispatch and/or disposition of material based upon an... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dispatch and/or disposition of material based upon an..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dispatch and/or disposition of material based upon an... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3389662

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.