Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1986-04-22
1988-04-05
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041921, 2041922, 118500, 118504, 118505, 292347, C23C 1400
Patent
active
047357010
ABSTRACT:
A carrier is provided to hold a centrally apertured disk while magnetic material is coated simultaneously on the two surfaces of the disk. A carrier includes a plate which contains a first opening through the plate slightly smaller than the disk diameter and a second opening partially through the plate formed about a center line offset from the center line of the first opening to form a recess around an upper portion of first opening edge. The disk is directed into the recess and first opening and then lowered into a groove at the bottom of the first opening. The groove and recess in conjunction with the disk edges block flow of plasma and impurities from one side of the disk to the other during simultaneous coating of magnetic media on the disk surfaces. A two-part plug is placed in the disk center aperture, one part containing a spring or magnet for holding the two parts together in the disk. The plug also serves as a handle by which the disk can be carried, mounted in or removed from the carrier. A plurality of carrier openings allow all surfaces of a corresponding plurality of disks mounted therein to be coated simultaneously with magnetic media. Some of the second openings may be provided on one side and the remainder of the second openings on the other side of the carrier to provide for simultaneous loading and unloading of disks from both sides of the carrier.
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Allen Ronald
Chen Tu
Komag, Inc.
MacDonald Thomas S.
MacPherson Alan H.
Nguyen Nam X.
Niebling John F.
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