Disinfecting oral hygiene compositions and process for using the

Details Disinfecting oral hygiene compositions and process for using the Disinfecting oral hygiene compositions and process for using the

1990-02-28

1992-03-31

Schenkman, Leonard

Drug, bio-affecting and body treating compositions

Dentifrices

Oxygen or chlorine releasing compound containing

424661, A61K 720, A61K 3314

Patent

active

051006529

ABSTRACT:
The present invention provides low concentration chlorous-acid generating compositions useful for oral hygiene. The compositions are effective oral disinfectants which do not have the strong unpleasant taste of chlorine and are useful in reducing plaque. The invention also concerns processes for making the inventive compositions and methods for using the same.

REFERENCES:
patent: Re31779 (1984-12-01), Alliger
patent: 2332180 (1943-10-01), Soule
patent: 2484637 (1949-10-01), Mattocks, Jr. et al.
patent: 2550622 (1951-04-01), Taub
patent: 2701782 (1955-02-01), Cutler
patent: 2726982 (1955-12-01), Ochs et al.
patent: 3186869 (1965-06-01), Friedman
patent: 3518343 (1970-06-01), Welsh et al.
patent: 3663716 (1972-05-01), Stolar
patent: 3754079 (1973-08-01), Callerame
patent: 4104190 (1978-08-01), Hartshorn
patent: 4330531 (1982-05-01), Alliger
patent: 4585482 (1986-04-01), Tice et al.
patent: 4690772 (1987-09-01), Tell et al.
patent: 4696811 (1987-09-01), Ratcliff
Chemical Abstracts No. 80:74331g (1974).
Gordon et al., "The Chemistry of Chlorine Dioxide", Prog. Inorg. Chem., 15:201, 1972.
Derwent Abstract No. 25988 K/11 (Feb. 3, 1981).

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