Semiconductor device manufacturing: process – Making passive device – Resistor
Reexamination Certificate
2008-05-20
2008-05-20
Lebentritt, Michael S. (Department: 2812)
Semiconductor device manufacturing: process
Making passive device
Resistor
C257SE21363, C257SE27047, C257SE21022, C257SE21016
Reexamination Certificate
active
07375000
ABSTRACT:
A semiconductor resistor, method of making the resistor and method of making an IC including resistors. Buried wells are formed in the silicon substrate of a silicon on insulator (SOI) wafer. At least one trench is formed in the buried wells. Resistors are formed along the sidewalls of the trench and, where multiple trenches form pillars, in the pillars between the trenches by doping the sidewalls with an angled implant. Resistor contacts are formed to the buried well at opposite ends of the trenches and pillars, if any.
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Nowak Edward J.
Williams Richard Q.
Canale Anthony
Dinh Thu-Huong
International Business Machines - Corporation
Law Office of Charles W. Peterson, Jr.
Lebentritt Michael S.
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