Discrete constant pressure system for staging solid-vapor compou

Refrigeration – Processes – Evaporation induced by sorption

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Details

62480, 62112, 62106, 16510412, 252 69, F25B 1500

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active

052633306

ABSTRACT:
An apparatus comprises a plurality of two or more reaction chambers, each having a different compound therein comprising a solid reactant adsorbent and a gaseous reactant adsorbed thereon, each of said compounds having a different gaseous refrigerant vapor pressure, substantially independent of the concentration of the gaseous reactant, and having an ascending order of gaseous reactant vapor pressure wherein the adsorption temperature of a lower vapor pressure compound at adsorption temperature of a lower vapor pressure compound at adsorption pressure is at least 8.degree..degree.C. higher than the desorption temperature of the next successive higher vapor pressure compound at desorption pressure, means for directing heat transfer fluid to an from said reaction chambers whereby heat from an exothermic adsorption reaction is directed to a reaction chamber for driving an endothermic desorption reaction, and heat exchange means for selectively recovering and/or adsorbing heat from said reaction chambers, refrigerant condenser means comprising a single condenser or two or more condensers, each operating at a different temperature, and refrigerant evaporator means comprising a single evaporator or two or more evaporators, each operating at a different temperature. Other improvements comprise a vapor recuperator and a liquid subcooler.

REFERENCES:
patent: 668310 (1901-02-01), Howell
patent: 1887909 (1932-11-01), Altenkirch
patent: 1932492 (1933-10-01), Smith
patent: 2088276 (1937-07-01), Nesselmann et al.
patent: 2242191 (1941-05-01), Kleen
patent: 2496459 (1950-02-01), Kleen
patent: 3633373 (1972-01-01), Carbonell
patent: 4111002 (1978-09-01), Van Mal et al.
patent: 4183227 (1980-01-01), Bouvin et al.
patent: 4408468 (1983-10-01), Aiefeld et al.
patent: 4410028 (1983-10-01), Alefeld et al.
patent: 4523635 (1985-06-01), Nishizaki et al.
patent: 4610148 (1986-09-01), Shelton
patent: 4694659 (1987-09-01), Shelton
patent: 4713944 (1987-12-01), Januschkowetz
patent: 4754805 (1988-07-01), Rothmeyer
patent: 4765395 (1988-08-01), Paeye et al.
patent: 4823864 (1989-04-01), Rockenfeller
patent: 4831829 (1989-05-01), Jones et al.
patent: 4875346 (1989-10-01), Jones et al.
patent: 4881376 (1989-11-01), Yonezawa et al.
patent: 4944159 (1990-07-01), Crozat
patent: 4976117 (1990-12-01), Crozat et al.
patent: 5025635 (1991-06-01), Rockenfeller et al.
patent: 5046319 (1991-09-01), Jones
patent: 5057132 (1991-10-01), Lebrun et al.

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