Discharge produced plasma EUV light source

Radiant energy – Radiant energy generation and sources – With radiation modifying member

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S505100

Reexamination Certificate

active

11493945

ABSTRACT:
An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis or rotation and an ellipse in another. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members.

REFERENCES:
patent: 2759106 (1956-08-01), Wolter
patent: 3150483 (1964-09-01), Mayfield et al.
patent: 3232046 (1966-02-01), Meyer
patent: 3279176 (1966-10-01), Boden
patent: 3746870 (1973-07-01), Demarest
patent: 3960473 (1976-06-01), Harris
patent: 3961197 (1976-06-01), Dawson
patent: 3969628 (1976-07-01), Roberts et al.
patent: 4042848 (1977-08-01), Lee
patent: 4088966 (1978-05-01), Samis
patent: 4143275 (1979-03-01), Mallozzi et al.
patent: 4162160 (1979-07-01), Witter
patent: 4203393 (1980-05-01), Giardini
patent: 4223279 (1980-09-01), Bradford, Jr. et al.
patent: 4364342 (1982-12-01), Asik
patent: 4369758 (1983-01-01), Endo
patent: 4455658 (1984-06-01), Sutter, Jr.
patent: 4504964 (1985-03-01), Cartz et al.
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4536884 (1985-08-01), Weiss et al.
patent: 4538291 (1985-08-01), Iwamatsu
patent: 4561406 (1985-12-01), Ward
patent: 4596030 (1986-06-01), Herziger et al.
patent: 4618971 (1986-10-01), Weiss et al.
patent: 4626193 (1986-12-01), Gann
patent: 4633492 (1986-12-01), Weiss et al.
patent: 4635282 (1987-01-01), Okada et al.
patent: 4644576 (1987-02-01), Kuyel
patent: 4751723 (1988-06-01), Gupta et al.
patent: 4752946 (1988-06-01), Gupta et al.
patent: 4774914 (1988-10-01), Ward
patent: 4837794 (1989-06-01), Riordan et al.
patent: 4928020 (1990-05-01), Birx et al.
patent: 4959840 (1990-09-01), Akins et al.
patent: 5023884 (1991-06-01), Akins et al.
patent: 5023897 (1991-06-01), Neff et al.
patent: 5025445 (1991-06-01), Anderson et al.
patent: 5025446 (1991-06-01), Kuizenga
patent: 5027076 (1991-06-01), Horsley et al.
patent: 5102776 (1992-04-01), Hammer et al.
patent: 5126638 (1992-06-01), Dethlefsen
patent: 5142166 (1992-08-01), Birx
patent: 5175755 (1992-12-01), Kumakhov
patent: 5189678 (1993-02-01), Ball et al.
patent: 5241244 (1993-08-01), Cirri
patent: 5243638 (1993-09-01), Wang et al.
patent: 5313481 (1994-05-01), Cook et al.
patent: 5315611 (1994-05-01), Ball et al.
patent: 5359620 (1994-10-01), Akins
patent: 5411224 (1995-05-01), Dearman et al.
patent: 5442910 (1995-08-01), Anderson
patent: 5448580 (1995-09-01), Birx et al.
patent: 5471965 (1995-12-01), Kapich
patent: 5499282 (1996-03-01), Silfvast
patent: 5504795 (1996-04-01), McGeoch
patent: 5729562 (1998-03-01), Birx et al.
patent: 5763930 (1998-06-01), Partlo
patent: 5768339 (1998-06-01), O'Hara
patent: 5771258 (1998-06-01), Morton et al.
patent: 5852621 (1998-12-01), Sandstrom
patent: 5863017 (1999-01-01), Larson et al.
patent: 5866871 (1999-02-01), Birx
patent: 5936988 (1999-08-01), Partlo et al.
patent: 5953360 (1999-09-01), Vitruk et al.
patent: 5963616 (1999-10-01), Silfvast et al.
patent: 5978394 (1999-11-01), Newman et al.
patent: 5982800 (1999-11-01), Ishihara et al.
patent: 5991324 (1999-11-01), Knowles et al.
patent: 6005879 (1999-12-01), Sandstrom et al.
patent: 6014398 (2000-01-01), Hofmann et al.
patent: 6016325 (2000-01-01), Ness et al.
patent: 6018537 (2000-01-01), Hofmann et al.
patent: 6028880 (2000-02-01), Carlesi et al.
patent: 6031241 (2000-02-01), Silfvast et al.
patent: 6039850 (2000-03-01), Schulz
patent: 6051841 (2000-04-01), Partlo
patent: 6064072 (2000-05-01), Partlo et al.
patent: 6067311 (2000-05-01), Morton et al.
patent: 6094448 (2000-07-01), Fomenkov et al.
patent: 6104735 (2000-08-01), Webb
patent: 6108397 (2000-08-01), Cash, Jr.
patent: 6109574 (2000-08-01), Pan et al.
patent: 6128323 (2000-10-01), Myers et al.
patent: 6151349 (2000-11-01), Gong et al.
patent: 6164116 (2000-12-01), Rice et al.
patent: 6172324 (2001-01-01), Birx
patent: 6188710 (2001-02-01), Besaucele et al.
patent: 6192064 (2001-02-01), Algots et al.
patent: 6195272 (2001-02-01), Pascente
patent: 6208674 (2001-03-01), Webb et al.
patent: 6208675 (2001-03-01), Webb
patent: 6212211 (2001-04-01), Azzola et al.
patent: 6219368 (2001-04-01), Govorkov
patent: 6232613 (2001-05-01), Silfvast et al.
patent: 6240117 (2001-05-01), Gong et al.
patent: 6317447 (2001-11-01), Partlo et al.
patent: 6330261 (2001-12-01), Ishihara et al.
patent: 6359922 (2002-03-01), Partlo et al.
patent: 6414979 (2002-07-01), Ujazdowski et al.
patent: 6452199 (2002-09-01), Partlo et al.
patent: 6466365 (2002-10-01), Maier et al.
patent: 6477193 (2002-11-01), Oliver et al.
patent: 6566667 (2003-05-01), Partlo et al.
patent: 6566668 (2003-05-01), Rauch et al.
patent: 6567499 (2003-05-01), McGeoch
patent: 6576912 (2003-06-01), Visser et al.
patent: 6586757 (2003-07-01), Melnychuk et al.
patent: 6590959 (2003-07-01), Kandaka et al.
patent: 6744060 (2004-06-01), Ness et al.
patent: 6757316 (2004-06-01), Newman et al.
patent: 6795474 (2004-09-01), Partlo et al.
patent: 6804327 (2004-10-01), Schriever et al.
patent: 6815700 (2004-11-01), Melnychuk et al.
patent: 6894298 (2005-05-01), Ahmad et al.
patent: 6904073 (2005-06-01), Yager et al.
patent: 7015489 (2006-03-01), Singer et al.
patent: 447225 (2001-07-01), None
patent: 460972 (2001-10-01), None
patent: WO2004081503 (2004-09-01), None
U.S. Appl. No. 60/419,805, filed Jan. 18, 2002, Ness et al.
U.S. Appl. No. 60/422,808, filed Oct. 31, 2002, Partlo et al.
Apruzese, J.P., “X-Ray Laser Research Using Z Pinches,”Am. Inst. of Phys.399-403, (1994).
Bailey, et al., “Evaluation Of The Gas Puff Z Pinch As An X-Ray Lithography And Microscopy Source”,Appl. Phys. Lett.,40 (1), pp. 33-35 (Jan. 1, 1982).
Burnett, et al., “Symmetry Of Spatial-Dispersion-Induced Birefringence And Its Implication For CaF2Ultraviolet Optics”,JM,vol. 1 (3), (Oct. 2002).
Bollanti, et al., “Compact Three Electrodes Excimer Laser LANUS for a POPA Optical System,”SPIE Proc.(2206)144-153, (1994).
Bollanti, et al., “Ianus, the three-electrode excimer laser,”App. Phys. B(Lasers&Optics) 66(4):401-406, (1998).
Choi, et al., “A 1013A/s High Engery Density Micro Discharge Radiation Source,”B. Radiation Characteristics,p. 287-290.
Choi, et al., “Fast pulsed hollow cathode capillary discharge device,”Rev. of Sci. Instrum.69(9):3118-3122 (1998).
Choi, et al., “Temporal Development Of Hard And Soft X-Ray Emission From A Gas-Puff Z Pinch”,Rev. Sci. Instrum.57(8),pp. 2162-2164 (Aug. 1986).
Fomenkov, et al., “Characterization of a 13.5nm Source for EUV Lithography based on Dense Plasma Focus and Lithium Emission,” Sematech Intl. Workshop on EUV Lithography (Oct. 1999).
Georgescu, et al., “A Pspice Simulation Of A Plasma-Focus Device Driven By A Magnetic Pulse Compression Circuit”,Pulse Power'96, IEE Colloquium , pp. 32/1-32/1 (1996).
Giordano, et al., “Magnetic Pulse Compressor For Prepulse Discharge In Spiker-Sustainer Excitati Technique For XeC1 Lasers,”Rev. Sci. Instrum65(8),pp. 2475-2481 (Aug. 1994).
Hansson, et al., “Xenon liquid jet laser-plasma source for EUV lithography,” Emerging Lithographic Technologies IV,Proc. Of SPIE.vol. 3997:729-732 (2000).
Jahn,Physics of Electric Propulsion,McGraw-Hill Book Company, (Series in Missile and Space USA), Chap. 9 “Unsteady Electromagnetic Acceleration”, p. 257 (1986).
Kato, Yasuo, “Electrode Lifetimes in a Plasma Focus Soft X-Ray Source,”J. Appl. Phys.(33) Pt. 1, No. 8:4742-4744 (1991).
Kato, et al., 

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Discharge produced plasma EUV light source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Discharge produced plasma EUV light source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Discharge produced plasma EUV light source will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3829535

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.