Discharge produced plasma EUV light source

Radiant energy – Radiant energy generation and sources – With radiation modifying member

Reexamination Certificate

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C250S505100, C378S156000, C378S158000, C378S159000

Reexamination Certificate

active

10742233

ABSTRACT:
An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO2. The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.

REFERENCES:
patent: 2759106 (1956-08-01), Wolter
patent: 3150483 (1964-09-01), Mayfield et al.
patent: 3232046 (1966-02-01), Meyer
patent: 3279176 (1966-10-01), Boden
patent: 3746870 (1973-07-01), Demarest
patent: 3960473 (1976-06-01), Harris
patent: 3961197 (1976-06-01), Dawson
patent: 3969628 (1976-07-01), Roberts et al.
patent: 4042848 (1977-08-01), Lee
patent: 4088966 (1978-05-01), Samis
patent: 4143275 (1979-03-01), Mallozzi et al.
patent: 4162160 (1979-07-01), Witter
patent: 4203393 (1980-05-01), Giardini
patent: 4504964 (1985-03-01), Cartz et al.
patent: 4536884 (1985-08-01), Weiss et al.
patent: 4538291 (1985-08-01), Iwamatsu
patent: 4596030 (1986-06-01), Herziger et al.
patent: 4618971 (1986-10-01), Weiss et al.
patent: 4626193 (1986-12-01), Gann
patent: 4633492 (1986-12-01), Weiss et al.
patent: 4635282 (1987-01-01), Okada et al.
patent: 4751723 (1988-06-01), Gupta et al.
patent: 4752946 (1988-06-01), Gupta et al.
patent: 4837794 (1989-06-01), Riordan et al.
patent: 5023897 (1991-06-01), Neff et al.
patent: 5027076 (1991-06-01), Horsley et al.
patent: 5102776 (1992-04-01), Hammer et al.
patent: 5126638 (1992-06-01), Dethlefsen
patent: 5142166 (1992-08-01), Birx
patent: 5313481 (1994-05-01), Cook et al.
patent: 5411224 (1995-05-01), Dearman et al.
patent: 5448580 (1995-09-01), Birx et al.
patent: 5504795 (1996-04-01), McGeoch
patent: 5729562 (1998-03-01), Birx et al.
patent: 5763930 (1998-06-01), Partlo
patent: 5866871 (1999-02-01), Birx
patent: 5936988 (1999-08-01), Partlo et al.
patent: 5963616 (1999-10-01), Silfvast et al.
patent: 6031241 (2000-02-01), Silfvast et al.
patent: 6039850 (2000-03-01), Schulz
patent: 6051841 (2000-04-01), Partlo
patent: 6064072 (2000-05-01), Partlo et al.
patent: 6172324 (2001-01-01), Birx
patent: 6195272 (2001-02-01), Pascente
patent: 6452199 (2002-09-01), Partlo et al.
patent: 6566667 (2003-05-01), Partlo et al.
patent: 6566668 (2003-05-01), Rauch et al.
patent: 6576912 (2003-06-01), Visser et al.
patent: 6586757 (2003-07-01), Melnychuk et al.
patent: 6946669 (2005-09-01), Kleinschmidt
patent: 2001/0055364 (2001-12-01), Kandaka et al.
patent: 2002/0100882 (2002-08-01), Partlo et al.
patent: 2002/0163313 (2002-11-01), Ness et al.
patent: 2002/0168049 (2002-11-01), Schriever et al.
patent: 2003/0006383 (2003-01-01), Melynchuk et al.
patent: 2003/0068012 (2003-04-01), Ahmad et al.
patent: 2003/0219056 (2003-11-01), Yager et al.
Apruzese, J.P., “X-Ray Laser Research Using Z Pinches,”Am. Inst. of Phys.399-403, (1994).
Bollanti, et al., “Compact Three Electrodes Excimer Laser IANUS for a POPA Optical System,”SPIE Proc.(2206)144-153, (1994).
Bollanti, et al., “Ianus, the three-electrode excimer laser,”App. Phys. B(Laser&Optics) 66(4):401-406, (1998).
Choi, et al., “A 1013A/s High Energy Density Micro Discharge Source,”B. Radiation Characteristics, p. 287-290.
Choi, et al., “Fast pulsed hollow cathode capillary discharge device,”Rev. of Sci. Instrum.69(9):3118-3122 (1988).
Fomenkov, et al., “Characterization of a 13.5nm Source for EUV Lithography based on a Dense Plasma Focus and Lithium Emission,” Sematech Intl. Workshop on EUV Lithography (Oct. 1999).
Hansson, et al., “Xenon liquid jet laser-plasma source for EUV lithography,” Emerging Lithographic Technologies IV. Proc. Of SPIE , vol. 3997:729-732 (2000).
Kato, Yasuo, “Electrode Lifetimes in a Plasma Focus Soft X-Ray Source,”J. Appl. Phys.(33) Pt. 1, No. 8:4742-4744 (1991).
Kato, et al., “Plasma focus x-ray source for lithography,”Am. Vac. Sci. Tech. B., 6(1): 195-198 (1988).
Lebert, et al., “Soft x-ray emission of laser-produced plasmas using a low-debris cryogenic nitrogen target,”J. App. Phys., 84(6):3419-3421 (1998).
Lebert, et al., “A gas discharge based radiation source for EUV-lithography,” Intl. Conf. Micro and Nano-Engineering 98 (Sep. 22-24, 1998) Leuven, Belgium.
Lebert, et al., “Investigations of pinch plasmas with plasma parameters promising ASE,” Inst. Phys. Conf. Ser No. 125: Section 9, pp. 411-415 (1992) Schiersee, Germany.
Lebert, et al., “Comparison of laser produced and gas discharge based EUV sources for different applications,” Intl. Conf. Micro- and Nano-Engineering 98 (Sep. 22-24, 1998) Leuven, Belgium.
Lee, Ja H., “Production of dense plasmas in hypocyloidal pinch apparatus,”The Phys. Of Fluids, 20(2):313-321 (1977).
Lewis, Ciaran L.S., “Status of Collision-Pumped X-ray Lasers,”Am. Inst. Phys.pp. 9-16 (1994).
Malmqvist, et al., “Liquid-jet target for laser-plasma soft x-ray generation,”Am. Inst. Phys.67(12):4150-4153 1996).
Mather, et al., “Stability of the Dense Plasma Focus,”Phys. Of Fluids, 12(11):2343-2347 (1969).
Mayo, et al., “A magnetized coaxial source facility for the generation of energetic plasma flows,”Sci. Technol.vol. 4:pp. 47-55 (1994).
Mayo, et al., “Initial Results on high enthalpy plasma generation in a magnetized coaxial source,”Fusion Techvol. 26:1221-1225 (1994).
Nilsen, et al., “Analysis of resonantly photopumped Na-Ne x-ray-laser scheme,”Am Phys. Soc.44(7):4591-4597 (1991).
Partlo, et al., “EUV (13.5nm) Light Generation Using a Dense Plasma Focus Device,”SPIE Proc. On Emerging Lithographic Technologies III, vol. 3676, 846-858 (Mar. 1999).
Porter, et al., “Demonstration of Population Inversion by Resonant Photopumping in a Neon Gas Cell Irradiated by a Sodium Z Pinch,”Phys. Rev. Let., 68(6):796-799, (Feb. 1992).
Price, Robert H., “X-Ray Microscopy using Grazing In

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