Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1996-09-25
1999-04-20
Gorgos, Kathryn L.
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
204165, 427569, 427571, 42218605, 422906, H05F 300
Patent
active
058955585
ABSTRACT:
Two methods and corresponding electrode designs are provided for the generation of a plasma at or about one atmosphere. Using these methods, various webs, films and three-dimensional objects are beneficially treated in a reduced amount of time. A first method utilizes a repetitive, asymmetric voltage pulse to generate a plasma discharge between two electrodes. An asymmetric voltage pulse is used to generate a discharge in which a substrate can be exposed predominately to either positive or negative plasma species depending on the voltage polarity used. A second method uses the gap capacitance of an electrode pair and an external inductor in shunt to form a resonant LC circuit. The circuit is driven by a high power radio frequency source operating at 1 to 30 MHz to generate a uniform discharge between the electrode pair. Both methods have temperature controlled discharge surfaces with supply gas temperature, humidity and flow rate control. The gas flow is typically sufficient to cause a turbulent flow field in the discharge region where materials are treated. Electrode pairs implement these methods and include a metal faced electrode and a dielectric covered electrode, one or both of which have a series of holes extending through the electrode face for supply gas flow. The second of the above-described methods will also operate with paired, metal faced electrodes, but under more restricted operating conditions.
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Gorgos Kathryn L.
Mayekar Kishor
The University of Tennessee Research Corporation
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