Discharge device and method for use in processing semiconductor

Details Discharge device and method for use in processing semiconductor Discharge device and method for use in processing semiconductor

1979-11-29

1982-09-21

Reynolds, B. A.

Electric heating

Metal heating

By arc

219 69V, 219 68, 219113, 269903, 29584, B23K 1500, B23P 100

Patent

active

043508669

ABSTRACT:
An electrical discharge is applied to a wafer mounted in a wafer holder. The wafer includes at least one conducting region covered by an insulating layer. The discharge causes a conductive channel from the conductive region through the insulating layer. The conductive channel provides a relatively low impedance path suitable for conducting away electrons which are injected into the region during processing steps such as electron beam exposure.

REFERENCES:
patent: 3324276 (1967-06-01), Osenbruggen et al.
patent: 3646305 (1972-02-01), Schmidtke et al.
patent: 3775644 (1973-11-01), Cotner et al.
patent: 4060888 (1977-12-01), Bottom et al.
"Electron Beam Welding", p. 545, 1974, Problems in Scanning.

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