Work holders – Work-underlying support – Gapped support
Patent
1975-12-08
1978-06-06
Watson, Robert C.
Work holders
Work-underlying support
Gapped support
211 41, 269321WE, B23Q 300
Patent
active
040932010
ABSTRACT:
A support structure composed of Si or SiC for supporting semiconductor crystal discs during annealing or doping thereof. A somewhat tube-shaped member having at least one flat side is formed by thermal deposition of a gaseous silicon compound onto a similarly shaped carrier member and the tube-shaped member is then cut and mechanically processed in directions parallel and perpendicular to the axes of the tube to form a support structure having a flat base and upwardly extending curved side walls.
REFERENCES:
patent: 2908474 (1959-10-01), Chiarito
patent: 3610613 (1971-10-01), Worden
patent: 3828726 (1974-08-01), Dietze et al.
patent: 3834349 (1974-09-01), Dietze et al.
IBM Technical Disclosure Bulletin, vol. 13, No. 6, Nov. 1970, p. 1446.
Dietze Wolfgang
Mittermeier Richard
Steinwagner Gerhard
Siemens Aktiengesellschaft
Watson Robert C.
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