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Stock material or miscellaneous articles – All metal or with adjacent metals – Having magnetic properties – or preformed fiber orientation...

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428652, 428667, 428680, 428928, 360135, 204192M, G11B 566, G11B 582, C23C 1500

Patent

active

045528209

ABSTRACT:
A thin-film disc fabrication method and structure contemplates a sputtered undercoat. An aluminum base is subjected to a fine polishing step, and a relatively thin undercoat is deposited by sputtering. The preferred undercoat is a 0.3-3 micron layer of nickel-vanadium alloy (on the order of 7% vanadium). The preferred recording layer is a sputtered composite structure comprising a layer of chromium and an overlying layer of a cobalt-chromium alloy. Modulation effects can be substantially eliminated by heating the aluminum base prior to sputtering the nickel-vanadium undercoat, and by oxidizing the undercoat prior to deposition of the overlying layers.

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patent: 4245008 (1981-01-01), Michaelsen et al.
patent: 4307156 (1981-12-01), Yanagisawa
patent: 4411963 (1983-10-01), Aine
patent: 4426265 (1984-01-01), Brunsch et al.
patent: 4444848 (1984-04-01), Shanefield et al.
"R.F. Sputtered Co-Cr Layers for Perpendicular Magnetic Recording", Lodder et al., Thin Solid Films, 101 (1983) 61-73.
"Nitrogen-Induced FCC Phase in Rf Sputtered Co-Cr Films . . . ", Coughlin, T. M., J. Vac. Sci. Technol., 20(2), Feb. 1982.
"RF-Sputtered Chromium-Cobalt Films for High-Density Longitudinal Magnetic Recording", W. T. Maloney, IEEE Transactions on Magnetics, vol. Mag.-15, No. 6, Nov. 1979, pp. 1546-1548.
"Effect of Ion Bombardment During Deposition on Magnetic Film Properties, L. F. Herte, A. Long, Jr., Journal of Vacuum Science Technology 18(2), Mar. 1981, pp. 153-155.
"The Optimization of Sputtered Co-Cr Layered Medium for Maximum Areal Density", W. T. Maloney, IEEE Transactions on Magnetics, vol. Mag.-17, No. 6, Nov. 1981, pp. 3196-3197.
"Trends in Metallization Materials", Ron Iscoff, Semiconductor International, Oct. 1982, pp. 57-65.

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