Directional emittance surface measurement system and process

Radiant energy – Infrared-to-visible imaging

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250340, 374 9, G01N 2171, G01N 2500

Patent

active

053471288

ABSTRACT:
Apparatus and process for measuring the variation of directional emittance of surfaces at various temperatures using a radiometric infrared imaging system. A surface test sample is coated onto a copper target plate provided with selective heating within the desired incremental temperature range to be tested and positioned onto a precision rotator to present selected inclination angles of the sample relative to the fixed positioned and optically aligned infrared imager. A thermal insulator holder maintains the target plate on the precision rotator. A screen display of the temperature obtained by the infrared imager, and inclination readings are provided with computer calculations of directional emittance being performed automatically according to equations provided to convert selected incremental target temperatures and inclination angles to relative target directional emittance values. The directional emittance of flat black lacquer and an epoxy resin measurements obtained are in agreement with the predictions of the electromagnetic theory and with directional emittance data inferred from directional reflectance measurements made on a spectrophotometer.

REFERENCES:
patent: 3340722 (1967-09-01), Gabron et al.
patent: 4716293 (1987-12-01), Harrick
patent: 5098195 (1992-03-01), Halyo et al.
patent: 5239488 (1993-08-01), Markham et al.
patent: 5250809 (1993-10-01), Nakata et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Directional emittance surface measurement system and process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Directional emittance surface measurement system and process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Directional emittance surface measurement system and process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1122110

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.