Coating processes – Direct application of electrical – magnetic – wave – or... – Chemical vapor deposition
Patent
1994-08-31
1996-07-09
Beck, Shrive
Coating processes
Direct application of electrical, magnetic, wave, or...
Chemical vapor deposition
427586, 427561, 427566, 427567, 118726, 118727, 118723E, C23C 800
Patent
active
055343147
ABSTRACT:
A process for vapor depositing an evaporant onto a substrate is provided which involves:
presenting the substrate to a deposition chamber, wherein the deposition chamber has an operating pressure of from 0.001 Torr to atmospheric pressure and has coupled thereto a carrier gas stream generator and an electron beam gun capable of providing an electron beam at the operating pressure and contains an evaporant source;
impinging the evaporant source with the electron beam to generate the evaporant;
entraining the evaporant in the carrier gas stream; and
coating the substrate with the carrier gas stream which contains the entrained evaporant, and an apparatus for performing the process.
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Groves James F.
Wadley Haydn N. G.
Beck Shrive
Maiorana David M.
University of Virginia Patent Foundation
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