Directed energy assisted in vacuo micro embossing

Details Directed energy assisted in vacuo micro embossing Directed energy assisted in vacuo micro embossing

1998-05-08

1999-12-28

Evans, Elizabeth

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428 642, 428 644, 428913, 264 11, 264 133, 264101, 4302701, 430945, B32B 300

Patent

active

06007888&

ABSTRACT:
Various configurations of a directed energy assisted micro embossing machine/station in a vacuum chamber utilized in a continuous manufacturing process and the web structure products made by that process (optical disks, cards, tapes, holographic reflectors, diffusers, binary optical elements, etc.) are disclosed. The configurations can include a single machine roll to roll system for embossing optical features on the surface of a single substrate and applying appropriate metallic, dielectric, semiconductor, polymer and other coatings all in a vacuum chamber.

REFERENCES:
patent: 5078947 (1992-01-01), Nishizawa et al.

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