Direct write nanolithographic deposition of nucleic acids...

Details Direct write nanolithographic deposition of nucleic acids... Direct write nanolithographic deposition of nucleic acids...

2011-05-31

2011-05-31

Nagpaul, Jyoti (Department: 1773)

Chemical apparatus and process disinfecting, deodorizing, preser

Control element responsive to a sensed operating condition

C422S091000, C422S105000, C422S063000, C422S064000, C422S065000, C436S180000, C073S105000, C435S006120

Reexamination Certificate

active

07951334

ABSTRACT:
The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.

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